| Air SPM of InSb-Related HeterostructuresRecently, we have begun a study of the surface morphologies of InSb quantum well structures.  These samples have been prepared in house using MBE techniques.  
For InSb based electronic devices, it is important to be able to grow the devices on a GaAs substrate.  Therefore, these structures were grown on GaAs with a GaSb buffer layer grown between the substrate and the QW to relax some of the 14% lattice mismatch.  The purpose of our study is to investigate the source of the surface morphology seen on InSb quantum wells.These include:
 The affect of surface roughness on InSb Quantum Well Systems, such as high-mobility electron layers, which display 
mobility anisotropy, or multi-quantum wells which show sharp exciton features.
 AFM Study of High-Electron Mobility InSb MaterialsInSb Multiple Quantum WellsCurrently the growth of InSb/AlxIn1-xSb Multiple Quantum Well (MQW)
            systems on buffered GaAs substrates incorporate a large number of defects which may 
            compromise their electronic and optical properties.  The defects initiate mainly at 
            the GaAs/buffer interface and are created to relieve
            the strain induced by the mismatch in lattice constants between the growing layers and the
            substrate.  The defects propagate and
            are destroyed as the thickness of the buffer increases and/or is modified
            through various compositional changes. The MQW structure, deposited after the buffer
            layer, inherits the remaining defects,
            mainly in the form of screw or threading dislocations which can be examined at the surface
            using Atomic Force Microscopy (AFM). This technique provides us with atomic resolution
            of the dislocations along the verticle axis and definitively shows the spiraling staircase
            of screw dislocations.In addition to the standard dislocations, we also see 
            Oriented Abrupt Steps or OAS's.  These steps occur predominately along the
 ![[1 -1 0]](http://aegir.nhn.ou.edu/~keay/Research/InSb/Images/1bar10.gif) axis, but may also be present along the [110] axis of the material.
            Contrary to the screw dislocations the OAS's have steep side wall angles of 5 to 15°
            which typically terminates at the peak of a screw dislocation. The OAS could then
            significantly alter the quantum well properties. If the MQW 
            structures follow the surface topology, which is extremely probable, the quantum wells
            will become 'pinched' at an OAS, reducing the well spacing, which will effectively change
            the electrical and optical properties of the system. In this work, we are using undoped MQW structures to correlate the structure of these defects,
            as viewed by AFM, with the observed optical (exitionic) transitions using Fourier transform infrared
            spectroscopy (FTIR).  Additional use of X-Ray Diffraction (XRD) in this work helps determine the
            amount strain as well as the alloy compostion, x, of the AlxIn1-xSb barrier layers in the system.
 
 
 PublicationsPlease (Click) on paper to get PDF version.
		  
              "Charaterization of InSb Quantum Wells Containing High-Mobility Electron Systems",  S.J. Cheung, S.C. Lindstrom, N. Dai, K.J. Goldammer, F. Brown, M.B. Johnson, R.E. Doezema, and 	M.B. Santos,  J. Vac. Sci. Technol. B 17, 1151 (1999).
	        
"Electrical Properties of InSb Quantum Wells Remotely-Doped with Si," K.J. Goldammer, W.K. Liu, G.A. Khodaparast, S.C. Lindstrom, M.B. Johnson, R.E. Doezema and M.B. Santos, J. Vac. Sci. Technol. B 16, 1367 (1998).
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