nPrepare the substrate (silicon wafer):
¡Wash with appropriate solvent to remove any matter and other impurities
nTCE, Acetone, MeOH
¡Dry in Oven at 150°C for 10 min.
¡Place on hotplate and cover
with petri dish, let temp. stabilize at 115°C.
nDeposit Primer (optional)
¡Chemical that coats the substrate and allows for better adhesion of the resist
¡
nTCE = trichloroethylene, MeOH =
methanol