·After
a pattern has been transferred, the ITO
layer of the ACTFEL lamp can be etched.
-A solution of hydrochloric acid and nitric acid will oxidize and remove the conductive metal oxide.
·The
etched pattern shown below was created
by photolithography using the mask shown
to the right.
·Other
lithographic techniques (such as molecular
beam epitaxy) can be used to etch
the ITO
·Note: The pattern is reversed because the lamp will be viewed from the opposite side of the glass.
·