OU NanoLab/NSF NUE/Bumm & Johnson
Patterning ITO coated slides
After a pattern has been transferred, the
ITO layer of the ACTFEL lamp can be
A solution of hydrochloric acid and nitric acid
will oxidize and remove the conductive metal
The etched pattern shown below was
created by photolithography using the mask
shown to the right.
Other lithographic techniques (such as
molecular beam epitaxy) can be used to
etch the ITO
: The pattern is reversed because the
lamp will be viewed from the opposite side
of the glass.